| Roughness measurement using optical profiler with self-reference laser and stylus instrument—A comparative study M Chand, A Mehta, R Sharma, VN Ojha, KP Chaudhary Indian Journal of Pure and Applied Physics 49 (5), 335, 2011 | 51 | 2011 |
| Automatic mask alignment without a microscope AK Kanjilal, R Narain, R Sharma, VT Chitnis, BP Singh, J Liu, J Yamada, ... Instrumentation and Measurement, IEEE Transactions on 44 (3), 806-809, 1995 | 42 | 1995 |
| Precision position control systems using moiré signals J Liu, H Furuhashi, A Torii, N Hayashi, J Yamada, Y Uchida, R Sharma, ... Industrial Electronics, Control, and Instrumentation, 1995., Proceedings of …, 1995 | 30 | 1995 |
| Automatic mask alignment in the theta direction using moiré sensors J Liu, H Furuhashi, A Torii, R Sharma, VT Chitnis, BP Singh, J Yamada, ... Nanotechnology 6 (4), 135, 1995 | 21 | 1995 |
| Fabrication and analysis of MEMS test structures for residual stress measurement A Sharma, D Bansal, M Kaur, P Kumar, D Kumar, R Sharma, KJ Rangra Sens. Transducers 13, 21-30, 2011 | 20 | 2011 |
| Precision alignment of pulse stage using moire signals JN Liu, L Zhou, H Uchida, A Kono, R Sharma, VT Chitnis, H Furuhashi, ... SICE 2002. Proceedings of the 41st SICE Annual Conference 1, 382-385, 2002 | 19 | 2002 |
| Tracking and dynamic control of the angular alignment position in a photolithographic mask aligner by the moiré interference technique BP Singh, T Goto, R Sharma, AK Kanjilal, R Narain, VT Chitnis, J Liu, ... Review of scientific instruments 66 (3), 2658-2660, 1995 | 16 | 1995 |
| Design of a Laser-Warning System Using an Array of Discrete Photodiodes-Part II S Kumar, S Prakash, AK Maini, VB Patil, RB Sharma Journal of Battlefield Technology 14 (2), 13, 2011 | 10 | 2011 |
| Pitch measurements of 1D/2D gratings using optical profiler and comparison with SEM/AFM D Sharma, R Sharma, S Dua, VN Ojha AdMet 2012, 1-4, 2012 | 6 | 2012 |
| Photolithographic mask aligner based on modified moire technique R Sharma, ND Kataria, VN Ojha, AK Kanjilal, R Narain, VT Chitnis, ... SPIE's 1995 Symposium on Microlithography, 938-944, 1995 | 6 | 1995 |
| Computer-controlled in-plane alignment using a modified moiré technique R Sharma, R Narain, AK Kanjilal, VT Chitnis Optical Engineering 33 (6), 1930-1933, 1994 | 2 | 1994 |
| Mask alignment technique using phase-shifted moire signals R Sharma, GA Bhat, AK Kanjilal, R Narain, MS Rashmi, VT Chitnis, ... SPIE'S 1993 Symposium on Microlithography, 555-565, 1993 | 2 | 1993 |
| NON-CONTACT AND PRECISE MEASUREMENT OF SMALL TILT ANGLE USING LAU INTERFEROMETRY AND WAVELET TRANSFORM S Singh, S Prakash, R Sharma, KP Chaudhary | 2* | |
| An automatic angular positioning of mask with wafer using modified moire technique BP Singh, R Sharma, R Narain, AK Kanjilal, RP Singh, VT Chitnis, ... Emerging OE Technologies, Bangalore, India, 97-101, 1992 | 1 | 1992 |
| Development and investigation of frequency references for the 1.55-μm optical communication band YV Dancheva, R Sharma, U Sterr, F Riehle 10th International School on Quantum Electronics: Lasers--Physics and …, 1999 | | 1999 |
| Development and investigation of frequency references for the 1.55- m optical communication band [3571-34] Y Dancheva, R Sharma, U Sterr, F Riehle PROCEEDINGS-SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, 209-213, 1998 | | 1998 |
| Step Height Comparison by Non Contact Optical Profiler, AFM and Stylus Methods S Dua, R Sharma, D Sharma, VN Ojha | | |
| Digital PRT: A Case Study for Uncertainty Estimation JK GUPTA, R SHARMA | | |
| APPLICATION OF ISO GUIDELINES FOR EVALUATION OF UNCERTAINTY IN PHOTOLITHOGRAPHIC MASK-WAFER ALIGNMENT USING MODIFIED MOIRÉ TECHNIQUE R Sharma, VN Ojha, VT Chitnis, H Uchida, Y Uchida, RP Singhal | | |
| THERMAL EXPANSIVITY OF GAUGE BLOCKS R Sharma, BK Roy, RP Singhal | | |
