| A photoacid generator integrated terpolymer for electron beam lithography applications: sensitive resist with pattern transfer potential S Nandi, M Yogesh, PG Reddy, SK Sharma, CP Pradeep, S Ghosh, ... Materials Chemistry Frontiers 1 (9), 1895-1899, 2017 | 13 | 2017 |
| Broad Range (254–302 nm) and High Performance Ga2O3:SnO2 Based Deep UV Photodetector A Mondal, S Nandi, MK Yadav, A Nandi, A Bag IEEE Transactions on Nanotechnology 21, 320-327, 2022 | 8 | 2022 |
| Macrocycle network-aided nanopatterning of inorganic resists on silicon S Nandi, L Khillare, MG Moinuddin, S Kumar, M Chauhan, SK Sharma, ... ACS Applied Nano Materials 5 (8), 10268-10279, 2022 | 6 | 2022 |
| New non-chemically amplified molecular resist design with switchable sensitivity for multi-lithography applications and nanopatterning N Thakur, PG Reddy, S Nandi, M Yogesh, SK Sharma, CP Pradeep, ... Journal of Micromechanics and Microengineering 27 (12), 125010, 2017 | 4 | 2017 |
| Ferrocene bearing non-ionic poly-aryl tosylates: synthesis, characterization and electron beam lithography applications PG Reddy, M MG, AM Joseph, S Nandi, S Ghosh, CP Pradeep, ... Journal of Photopolymer Science and Technology 31 (6), 669-678, 2018 | 3 | 2018 |
| Induced Chemical Networking of Organometallic Tin in a Cyclic Framework for Sub-10 nm Patterning and Interconnect Application S Nandi, L Khillare, S Kumar, MG Moinuddin, M Chauhan, S Choudhary, ... ACS Applied Nano Materials 6 (6), 4132-4140, 2023 | 2 | 2023 |
| Performance evaluation of GaN-based selective UV photodetector by varying metal-semiconductor-metal geometry I Kumari, S Nandi, A Bag 2019 Electron Devices Technology and Manufacturing Conference (EDTM), 363-367, 2019 | 2 | 2019 |
| Inorganic Resists: Synthesis, Thin Film Characterization and Nanopatterning S Nandi Indian Institute of Technology Mandi, 2023 | | 2023 |
| Negative tone resist compositions for lithography Santu Nandi, Lalit Khillare, M. G. Moinuddin, Sunil Kumar, Manvendra Chauhan ... IN Patent 460,129, 2021 | | 2021 |
| A process for i-line resist dissolution modulation using hydroxy-styrene based ter-polymer S Nandi, L Khillare, M Yogesh, S Dolai, CP Pradeep, SK Sharma, ... IN Patent 391,608, 2021 | | 2021 |
| Optimization of molecular weight distribution in terpolymer DUV Photoresists. KEG Midathala Yogesh, Santu Nandi, Satinder K. Sharma, Chullikkattil P ... Materials Research Society Of India, 2018 | | 2018 |
| Cresol Novolak Photoresists: Effect of Compositions, Fractionation and Oligomer concentration on Patterning Potential for Thick Film KEG J S Borah , P K Yadav ,S. Nandi, R. Yadav, A. De, S. Jangra, S. K ... Materials Research Society Of India And National Symposium On Advances In …, 2018 | | 2018 |
| A New Class of Non-Chemically Amplified Molecular Photoresists for Next Generation Integrated Circuits (ICs) Technology K Gonsalves, S Ghosh, P Parameswaran, SK Sharma, N Thakur, ... IN Patent 452,719, 2016 | | 2016 |
| Oxidation of Fluoroquinolone Antibacterial Agent, Norfloxacin, by Lipophilic Mn(VII): A Mechanistic Study SP S.Nandi National Institute of Technology Rourkela, 2013 | | 2013 |
| Synthesis of ester from aromatic acid using Zinc Triflate catalyst DM S.Nandi Indian institute of technology Guwahati, 2012 | | 2012 |
Pulikanti Guruprasad ReddyResearcher, University of Turku, Finland.Verified email at mail.huji.ac.il
