Arockiasamy Sebastian
Arockiasamy Sebastian
Verified email at vit.ac.in
Title
Cited by
Cited by
Year
Development, characterisation and rapid evaluation of standard enthalpies of vaporisation and fusion of volatile Bis (NR-salicylaldimine) nickel (II)(nR= methyl to pentyl …
S Arockiasamy, OM Sreedharan, C Mallika, VS Raghunathan, ...
Chemical engineering science 62 (6), 1703-1711, 2007
192007
Precursor development, characterisation and evaluation of sublimation enthalpies of novel volatile complexes of nickel
S Arockiasamy, C Mallika, OM Sreetharan, VS Raghunathan, ...
Inorganica Chimica Acta 362 (6), 1977-1983, 2009
162009
High regenerative nature of Paspalum scrobiculatum L., an important millet crop
S Arockiasamy, S Prakash, S Ignacimuthu
Current Science 80 (4), 496-498, 2001
152001
Plasma‐Assisted MOCVD of Titanium Oxide and its Composite Coatings Using Metallo‐organic Precursors
S Arockiasamy, VS Raghunathan, P Antony Premkumar, P Kuppusami, ...
Chemical Vapor Deposition 13 (12), 691-697, 2007
122007
Evaluation of enthalpy of sublimation of Zr (tmhd) 4 by using thermogravimetric transpiration method
TSA Jeevan, S Arockiasamy, T Mathews, VS Raghunathan, KS Nagaraja
Materials Letters 62 (25), 4170-4172, 2008
112008
Syntheses, characterisation and vapour pressure of metallo-organic titanium precursor for MOCVD applications
S Arockiasamy, K Manoj, MM Bhadbhade, C Mallika, KS Nagaraja
Inorganica Chimica Acta 363 (10), 2243-2249, 2010
102010
TG/DTA-based techniques for the determination of equilibrium vapour pressures of N, N′-propylenebis (2, 4-pentanedion-iminoato) nickel (II) for CVD applications
S Arockiasamy, PA Premkumar, OM Sreedharan, C Mallika, ...
Journal of materials science 41 (11), 3383-3390, 2006
92006
Synthesis, structure, vapour pressure and deposition of ZnO thin film by plasma assisted MOCVD technique using a novel precursor bis [(pentylnitrilomethylidine …
C Chandrakala, P Sravanthi, SR Bharath, S Arockiasamy, MG Johnson, ...
Journal of Molecular Structure 1130, 1-9, 2017
82017
Nanocrystalline Cu–Ni Thin Film by Plasma-Assisted Liquid Injection Chemical Vapor Deposition
MG Johnson, J Selvakumar, S Arockiasamy, KS Nagaraja
Advanced Science Letters 10 (1), 29-33, 2012
82012
Synthesis, crystal structure and vapour pressure studies of novel nickel complex as precursor for NiO coating by metalorganic chemical vapour deposition technique
M Chandrakala, SR Bharath, T Maiyalagan, S Arockiasamy
Materials Chemistry and Physics 201, 344-353, 2017
72017
Spectral characterisation of five volatile bis (NR-salicylaldimine) nickel (II)(where nR= methyl to pentyl) complexes and single crystal study on methyl analogue
S Arockiasamy, MG Johnson, C Mallika, OM Sreedharan, KS Nagaraja
Materials Chemistry and Physics 114 (1), 456-461, 2009
72009
Standard enthalpy of fusion of N, N′-ethylenebis (2, 4-pentanedion-iminoato) nickel (II) complex by DTA-based melting point depression studies
S Arockiasamy, PA Premkumar, OM Sreedharan, C Mallika, ...
Materials Letters 59 (11), 1334-1337, 2005
72005
Deposition of Ni/TiN Composite Coatings by a Plasma Assisted MOCVD Using an Organometallic Precursor
S Arockiasamy, T Maiyalagan, P Kuppusami, C Mallika, KS Nagaraja
Micro and Nanosystems 4 (3), 199-207, 2012
42012
Development and vapour pressure of metallo-organic precursors of copper for the deposition of copper thin films by a plasma-assisted MOCVD
MG Johnson, S Raj Bharath, S Arockiasamy, T Maiyalagan, J Selvakumar, ...
Inorganic and Nano-Metal Chemistry 47 (12), 1635-1642, 2017
2017
Vapour pressure of volatile precursor complexes of nickel and titanium for coating Tio2 Ni TiO2 and Ni TiN thin films by pamocvd process
S Arockiasamy
Chennai, 0
The system can't perform the operation now. Try again later.
Articles 1–15