| Advanced electronic and optoelectronic materials by Atomic Layer Deposition: An overview with special emphasis on recent progress in processing of high‐k dielectrics and other … L Niinistö, M Nieminen, J Päiväsaari, J Niinistö, M Putkonen, M Nieminen physica status solidi (a) 201 (7), 1443-1452, 2004 | 467 | 2004 |
| Method of depositing rare earth oxide thin films J Niinistō, M Putkonen, M Ritala, P Räisänen, A Niskanen, M Leskelä US Patent 6,858,546, 2005 | 431 | 2005 |
| Atomic Layer Deposition of High‐k Oxides of the Group 4 Metals for Memory Applications J Niinistö, K Kukli, M Heikkilä, M Ritala, M Leskelä Advanced Engineering Materials 11 (4), 223-234, 2009 | 174 | 2009 |
| Industrial applications of atomic layer deposition M Ritala, J Niinistö ECS transactions 25 (8), 641, 2009 | 172 | 2009 |
| Plasma-enhanced atomic layer deposition of silver thin films M Kariniemi, J Niinistö, T Hatanpää, M Kemell, T Sajavaara, M Ritala, ... Chemistry of Materials 23 (11), 2901-2907, 2011 | 149 | 2011 |
| Processing of Y2O3 thin films by atomic layer deposition from cyclopentadienyl-type compounds and water as precursors J Niinistö, M Putkonen, L Niinistö Chemistry of materials 16 (15), 2953-2958, 2004 | 143 | 2004 |
| Chemical vapour deposition: precursors, processes and applications M Ritala, H Parala, R Kanjolia, RD Dupuis, SE Alexandrov, SJC Irvine, ... Royal Society of Chemistry, 2008 | 126 | 2008 |
| Atomic layer deposition and characterization of vanadium oxide thin films T Blanquart, J Niinistö, M Gavagnin, V Longo, M Heikkilä, E Puukilainen, ... RSC advances 3 (4), 1179-1185, 2013 | 115 | 2013 |
| Surface-controlled deposition of Sc2O3 thin films by atomic layer epitaxy using β-diketonate and organometallic precursors M Putkonen, M Nieminen, J Niinistö, L Niinistö, T Sajavaara Chemistry of materials 13 (12), 4701-4707, 2001 | 102 | 2001 |
| Gadolinium oxide thin films by atomic layer deposition J Niinistö, N Petrova, M Putkonen, L Niinistö, K Arstila, T Sajavaara Journal of crystal growth 285 (1-2), 191-200, 2005 | 101 | 2005 |
| Method of depositing rare earth oxide thin films J Niinistö, M Putkonen, M Ritala, P Räisänen, A Niskanen, M Leskelä US Patent 7,498,272, 2009 | 100 | 2009 |
| ZrO2 thin films grown on silicon substrates by atomic layer deposition with Cp2Zr (CH3) 2 and water as precursors M Putkonen, J Niinistö, K Kukli, T Sajavaara, M Karppinen, H Yamauchi, ... Chemical Vapor Deposition 9 (4), 207-212, 2003 | 92 | 2003 |
| Novel mixed alkylamido-cyclopentadienyl precursors for ALD of ZrO 2 thin films J Niinistö, K Kukli, M Kariniemi, M Ritala, M Leskelä, N Blasco, A Pinchart, ... Journal of Materials Chemistry 18 (43), 5243-5247, 2008 | 89 | 2008 |
| Atomic Layer Deposition of Ga2O3 Films from a Dialkylamido-Based Precursor Dezelah, J Niinistö, K Arstila, L Niinistö, CH Winter Chemistry of materials 18 (2), 471-475, 2006 | 87 | 2006 |
| Structural and dielectric properties of thin films on silicon grown by atomic layer deposition from cyclopentadienyl precursor J Niinistö, M Putkonen, L Niinistö, K Kukli, M Ritala, M Leskelä Journal of applied physics 95 (1), 84-91, 2004 | 87 | 2004 |
| Deposition of yttria-stabilized zirconia thin films by atomic layer epitaxy from β-diketonate and organometallic precursors M Putkonen, T Sajavaara, J Niinistö, LS Johansson, L Niinistö Journal of Materials Chemistry 12 (3), 442-448, 2002 | 83 | 2002 |
| Controlled growth of HfO 2 thin films by atomic layer deposition from cyclopentadienyl-type precursor and water J Niinistö, M Putkonen, L Niinistö, SL Stoll, K Kukli, T Sajavaara, M Ritala, ... Journal of Materials Chemistry 15 (23), 2271-2275, 2005 | 81 | 2005 |
| Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars JD Caldwell, OJ Glembocki, FJ Bezares, MI Kariniemi, JT Niinistö, ... Optics express 19 (27), 26056-26064, 2011 | 79 | 2011 |
| Growth and phase stabilization of HfO2 thin films by ALD using novel precursors J Niinistö, M Mäntymäki, K Kukli, L Costelle, E Puukilainen, M Ritala, ... Journal of Crystal Growth 312 (2), 245-249, 2010 | 79 | 2010 |
| Evaluation and Comparison of Novel Precursors for Atomic Layer Deposition of Nb2O5 Thin Films T Blanquart, J Niinisto, M Heikkila, T Sajavaara, K Kukli, E Puukilainen, ... Chemistry of materials 24 (6), 975-980, 2012 | 72 | 2012 |
Jonas SundqvistSenior Scientist, Fraunhofer CNTVerified email at cnt.fraunhofer.de
