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Harinarayanan Puliyalil
Harinarayanan Puliyalil
IMEC, Kapeldreef 75, 3001 Leuven, Belgium
Verified email at ki.si
Title
Cited by
Cited by
Year
A review of plasma-assisted catalytic conversion of gaseous carbon dioxide and methane into value-added platform chemicals and fuels
H Puliyalil, DL Jurković, VDBC Dasireddy, B Likozar
RSC advances 8 (48), 27481-27508, 2018
1862018
Selective plasma etching of polymeric substrates for advanced applications
H Puliyalil, U Cvelbar
Nanomaterials 6 (6), 108, 2016
1282016
White paper on the future of plasma science and technology in plastics and textiles
U Cvelbar, JL Walsh, M Černák, HW de Vries, S Reuter, T Belmonte, ...
Plasma Processes and Polymers 16 (1), 1700228, 2019
922019
Capacitor-less, long-retention (> 400s) DRAM cell paving the way towards low-power and high-density monolithic 3D DRAM
A Belmonte, H Oh, N Rassoul, GL Donadio, J Mitard, H Dekkers, ...
2020 IEEE International Electron Devices Meeting (IEDM), 28.2. 1-28.2. 4, 2020
772020
An intensified atmospheric plasma-based process for the isolation of the chitin biopolymer from waste crustacean biomass
M Borić, H Puliyalil, U Novak, B Likozar
Green Chemistry 20 (6), 1199-1204, 2018
592018
In-situ cure and cure kinetic analysis of a liquid rubber modified epoxy resin
R Thomas, C Sinturel, J Pionteck, H Puliyalil, S Thomas
Industrial & engineering chemistry research 51 (38), 12178-12191, 2012
432012
Hydrothermal synthesis of rare-earth modified titania: Influence on phase composition, optical properties, and photocatalytic activity
N Rozman, DM Tobaldi, U Cvelbar, H Puliyalil, JA Labrincha, A Legat, ...
Materials 12 (5), 713, 2019
422019
Tailoring IGZO-TFT architecture for capacitorless DRAM, demonstrating > 103s retention, >1011 cycles endurance and Lg scalability down to 14nm
A Belmonte, H Oh, S Subhechha, N Rassoul, H Hody, H Dekkers, ...
2021 IEEE International Electron Devices Meeting (IEDM), 10.6. 1-10.6. 4, 2021
322021
Plasma‐activated methane partial oxidation reaction to oxygenate platform chemicals over Fe, Mo, Pd and zeolite catalysts
D Lašič Jurković, H Puliyalil, A Pohar, B Likozar
International Journal of Energy Research 43 (14), 8085-8099, 2019
322019
First demonstration of sub-12 nm Lg gate last IGZO-TFTs with oxygen tunnel architecture for front gate devices
S Subhechha, N Rassoul, A Belmonte, R Delhougne, K Banerjee, ...
2021 Symposium on VLSI Technology, 1-2, 2021
302021
Plasma as a tool for enhancing insulation properties of polymer composites
H Puliyalil, U Cvelbar, G Filipič, AD Petrič, R Zaplotnik, N Recek, ...
RSC Advances 5 (47), 37853-37858, 2015
252015
Corrosion studies of plasma modified magnesium alloy in simulated body fluid (SBF) solutions
HR Tiyyagura, H Puliyalil, G Filipič, KC Kumar, YB Pottathara, R Rudolf, ...
Surface and Coatings Technology 385, 125434, 2020
192020
Selective plasma etching of polymers and polymer matrix composites
H Puliyalil, G Filipič, U Cvelbar
Non-Thermal Plasma Technology for Polymeric Materials, 241-259, 2019
192019
Smallest Bimetallic CoPt3 Superparamagnetic Nanoparticles
M Karmaoui, JS Amaral, L Lajaunie, H Puliyalil, DM Tobaldi, RC Pullar, ...
The journal of physical chemistry letters 7 (20), 4039-4046, 2016
172016
Plasma-enabled sensing of urea and related amides on polyaniline
H Puliyalil, P Slobodian, M Sedlacik, R Benlikaya, P Riha, K Ostrikov, ...
Frontiers of Chemical Science and Engineering 10, 265-272, 2016
152016
Recent advances in the methods for designing superhydrophobic surfaces
H Puliyalil, G Filipič, U Cvelbar
InTech: Rijeka, Croatia, 311-335, 2015
152015
Three-layer BEOL process integration with supervia and self-aligned-block options for the 3 nm node
V Vega-Gonzalez, CJ Wilson, B Briggs, S Decoster, J Versluijs, ...
2019 IEEE International Electron Devices Meeting (IEDM), 19.3. 1-19.3. 4, 2019
142019
12-EUV layer surrounding gate transistor (SGT) for vertical 6-T SRAM: 5-nm-class technology for ultra-density logic devices
MS Kim, N Harada, Y Kikuchi, J Boemmels, J Mitard, T Huynh-Bao, ...
2019 Symposium on VLSI Technology, T198-T199, 2019
102019
Ultra-low Leakage IGZO-TFTs with Raised Source/Drain for Vt > 0 V and Ion > 30 µA/µm
S Subhechha, N Rassoul, A Belmonte, H Hody, H Dekkers, MJ van Setten, ...
2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and …, 2022
92022
Selective Plasma Etching of Polyphenolic Composite in O2/Ar Plasma for Improvement of Material Tracking Properties
H Puliyalil, G Filipič, U Cvelbar
Plasma Processes and Polymers 13 (7), 737-743, 2016
82016
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