| Plasma-assisted atomic layer deposition: basics, opportunities, and challenges HB Profijt, SE Potts, MCM Van de Sanden, WMM Kessels Journal of Vacuum Science & Technology A 29 (5), 2011 | 1039 | 2011 |
| Low temperature plasma-enhanced atomic layer deposition of metal oxide thin films SE Potts, W Keuning, E Langereis, G Dingemans, MCM Van de Sanden, ... Journal of The Electrochemical Society 157 (7), P66, 2010 | 207 | 2010 |
| Ultra-thin aluminium oxide films deposited by plasma-enhanced atomic layer deposition for corrosion protection SE Potts, L Schmalz, M Fenker, B Díaz, J Światowska, V Maurice, ... Journal of The Electrochemical Society 158 (5), C132, 2011 | 129 | 2011 |
| Atomic layer deposition HCM Knoops, SE Potts, AA Bol, WMM Kessels Handbook of Crystal Growth, 1101-1134, 2015 | 126 | 2015 |
| Energy-enhanced atomic layer deposition for more process and precursor versatility SE Potts, WMM Kessels Coordination Chemistry Reviews 257 (23-24), 3254-3270, 2013 | 123 | 2013 |
| Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma HCM Knoops, EMJ Braeken, K de Peuter, SE Potts, S Haukka, V Pore, ... ACS applied materials & interfaces 7 (35), 19857-19862, 2015 | 115 | 2015 |
| Enhanced doping efficiency of Al-doped ZnO by atomic layer deposition using dimethylaluminum isopropoxide as an alternative aluminum precursor Y Wu, SE Potts, PM Hermkens, HCM Knoops, F Roozeboom, ... Chemistry of Materials 25 (22), 4619-4622, 2013 | 94 | 2013 |
| Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide,[Al (CH3) 2 (μ-OiPr)] 2, as an alternative aluminum precursor SE Potts, G Dingemans, C Lachaud, WMM Kessels Journal of Vacuum Science & Technology A 30 (2), 2012 | 92 | 2012 |
| Room‐Temperature ALD of Metal Oxide Thin Films by Energy‐Enhanced ALD SE Potts, HB Profijt, R Roelofs, WMM Kessels Chemical Vapor Deposition 19 (4‐6), 125-133, 2013 | 90 | 2013 |
| Electrical transport and Al doping efficiency in nanoscale ZnO films prepared by atomic layer deposition Y Wu, PM Hermkens, BWH Van De Loo, HCM Knoops, SE Potts, ... Journal of Applied Physics 114 (2), 2013 | 88 | 2013 |
| Atomic layer deposition of B-doped ZnO using triisopropyl borate as the boron precursor and comparison with Al-doped ZnO D Garcia-Alonso, SE Potts, CAA van Helvoirt, MA Verheijen, ... Journal of Materials Chemistry C 3 (13), 3095-3107, 2015 | 65 | 2015 |
| Synthesis of zirconium guanidinate complexes and the formation of zirconium carbonitride via low pressure CVD SE Potts, CJ Carmalt, CS Blackman, F Abou-Chahine, D Pugh, ... Organometallics 28 (6), 1838-1844, 2009 | 42 | 2009 |
| Synthesis of zirconium guanidinate complexes and the formation of zirconium carbonitride via low pressure CVD SE Potts, CJ Carmalt, CS Blackman, F Abou-Chahine, D Pugh, ... Organometallics 28 (6), 1838-1844, 2009 | 42 | 2009 |
| Handbook of Crystal Growth HCM Knoops, SE Potts, AA Bol, WMM Kessels Elsevier 2, 1101-1134, 2015 | 41 | 2015 |
| Hydrogen–argon plasma pre-treatment for improving the anti-corrosion properties of thin Al2O3 films deposited using atomic layer deposition on steel E Härkönen, SE Potts, WMM Kessels, B Díaz, A Seyeux, J Światowska, ... Thin Solid Films 534, 384-393, 2013 | 35 | 2013 |
| Tungsten imido complexes as precursors to tungsten carbonitride thin films SE Potts, CJ Carmalt, CS Blackman, T Leese, HO Davies Dalton Transactions, 5730-5736, 2008 | 25 | 2008 |
| Bis (cyclopentadienyl) zirconium (IV) amides as possible precursors for low pressure CVD and plasma-enhanced ALD SE Potts, CJ Carmalt, CS Blackman, F Abou-Chahine, N Leick, ... Inorganica Chimica Acta 363 (6), 1077-1083, 2010 | 17 | 2010 |
| Reactivity of ZrCl4 and HfCl4 with silylamines and thermal decomposition of the compounds [MCl4 {NH (R)(SiR′ 3)}](M= Zr, Hf, R= tBu, R′= Me; R= SiR′ 3= SiMe3, SiMe2H) P Hasan, SE Potts, CJ Carmalt, RG Palgrave, HO Davies Polyhedron 27 (3), 1041-1046, 2008 | 14 | 2008 |
| Reactivity of ZrCl4 and HfCl4 with silylamines and thermal decomposition of the compounds [MCl4 {NH (R)(SiR′ 3)}](M= Zr, Hf, R= tBu, R′= Me; R= SiR′ 3= SiMe3, SiMe2H) P Hasan, SE Potts, CJ Carmalt, RG Palgrave, HO Davies Polyhedron 27 (3), 1041-1046, 2008 | 14 | 2008 |
| Catalytic Combustion Reactions During Atomic Layer Deposition of Ru Studied Using 18O2 Isotope Labeling N Leick, S Agarwal, AJM Mackus, SE Potts, WMM Kessels The Journal of Physical Chemistry C 117 (41), 21320-21330, 2013 | 13 | 2013 |
