Amyn Poonawala
Cited by
Cited by
Mask design for optical microlithography—an inverse imaging problem
A Poonawala, P Milanfar
IEEE Transactions on Image Processing 16 (3), 774-788, 2007
OPC and PSM design using inverse lithography: a nonlinear optimization approach
A Poonawala, P Milanfar
Optical Microlithography XIX 6154, 1159-1172, 2006
Double-exposure mask synthesis using inverse lithography
A Poonawala, P Milanfar
Journal of Micro/Nanolithography, MEMS and MOEMS 6 (4), 043001-043001-9, 2007
A pixel-based regularization approach to inverse lithography
A Poonawala, P Milanfar
Microelectronic Engineering 84 (12), 2837-2852, 2007
Prewarping techniques in imaging: applications in nanotechnology and biotechnology
A Poonawala, P Milanfar
Computational Imaging III 5674, 114-127, 2005
Simultaneous source-mask optimization: a numerical combining method
T Mülders, V Domnenko, B Küchler, T Klimpel, HJ Stock, AA Poonawala, ...
Photomask Technology 2010 7823, 997-1008, 2010
ILT for double exposure lithography with conventional and novel materials
A Poonawala, Y Borodovsky, P Milanfar
Optical Microlithography XX 6520, 996-1009, 2007
Shape estimation from support and diameter functions
A Poonawala, P Milanfar, RJ Gardner
Journal of Mathematical Imaging and Vision 24 (2), 229-244, 2006
Assist feature placement based on a focus-sensitive cost-covariance field
LD Barnes, BD Painter, Q Yan, Y Fan, J Li, A Poonawala
US Patent 7,954,071, 2011
Model-based assist feature placement using inverse imaging approach
AA Poonawala, BD Painter, LD Barnes
US Patent 8,010,913, 2011
Suppressing ringing effects from very strong off-axis illumination with novel OPC approaches for low k1 lithography
C Cork, F Amoroso, A Poonawala, S Jang, K Lucas
Optical Microlithography XXIII 7640, 507-517, 2010
Source mask optimization for advanced lithography nodes
A Poonawala, W Stanton, C Sawh
Optical Microlithography XXIII 7640, 613-622, 2010
Mask design for single and double exposure optical microlithography: an inverse imaging approach
A Poonawala
University of California, Santa Cruz, 2007
Establishing fast, practical, full-chip ILT flows using machine learning
T Cecil, K Braam, A Omran, A Poonawala, J Shu, C Vandam
Optical Microlithography XXXIII 11327, 12-29, 2020
A statistical analysis of shape reconstruction from areas of shadows
A Poonawala, P Milanfar, RJ Gardner
Conference Record of the Thirty-Sixth Asilomar Conference on Signals …, 2002
Model-based assist feature placement: an inverse imaging approach
A Poonawala, B Painter, J Mayhew
Photomask Technology 2008 7122, 277-286, 2008
Model-based assist feature placement for 32nm and 22nm technology nodes using inverse mask technology
A Poonawala, B Painter, C Kerchner
Photomask Technology 2009 7488, 317-328, 2009
Rigorous ILT optimization for advanced patterning and design-process co-optimization
K Selinidis, B Kuechler, H Cai, K Braam, W Hoppe, V Domnenko, ...
Optical Microlithography XXXI 10587, 174-183, 2018
Process window and integration results for full-chip model-based assist-feature placement at the 32 nm node and below
J Li, G Luk-Pat, A Poonawala, K Lucas, B Painter
Optical Microlithography XXIII 7640, 714-722, 2010
Integrating assist feature print fixing with OPC
LD Barnes, A Poonawala, BD Painter, AM Jost, TJ Takei, Y Li
Optical Microlithography XXII 7274, 368-379, 2009
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