| Polarity control for remote plasma TS Cho, YH Sen, S Park, D Lubomirsky US Patent 9,117,855, 2015 | 180 | 2015 |
| Dual discharge modes operation for remote plasma TS Cho, YH Sen, S Park, D Lubomirsky US Patent 9,773,648, 2017 | 179 | 2017 |
| High temperature chuck for plasma processing systems TQ Tran, S Malik, D Lubomirsky, SN Roy, S Kobayashi, TS Cho, S Park, ... US Patent 9,728,437, 2017 | 132 | 2017 |
| Low temperature chuck for plasma processing systems TQ Tran, Z Weng, D Lubomirsky, S Kobayashi, TS Cho, S Park, SM Phi, ... US Patent App. 14/612,857, 2016 | 132 | 2016 |
| Effects of electrode length on capacitively coupled external electrode fluorescent lamps TS Cho, YM Kim, NO Kwon, SJ Kim, JG Kang, EH Choi, G Cho Japanese journal of applied physics 41 (3B), L355, 2002 | 53 | 2002 |
| Capacitive coupled electrodeless discharge backlight driven by square pulses TS Cho, NO Kwon, YM Kim, HS Kim, SJ Kim, JG Kang, EH Choi, G Cho IEEE Transactions on Plasma Science 30 (5), 2005-2009, 2002 | 40 | 2002 |
| Characterization of an atmospheric-pressure helium plasma generated by 2.45-GHz microwave power Z Ouyang, V Surla, TS Cho, DN Ruzic IEEE Transactions on Plasma Science 40 (12), 3476-3481, 2012 | 35 | 2012 |
| Dual Discharge Modes Operation of an Argon Plasma Generated by Commercial Electronic Ballast for Remote Plasma Removal Process TS Cho, YH Sen, R Bokka, S Park, D Lubomirsky, S Venkataraman IEEE TRANSACTIONS ON PLASMA SCIENCE 42 (6), 1636, 2014 | 31 | 2014 |
| Influence of driving frequency on the system parameters in surface discharge of AC Plasma Display Panels EH Choi, TS Cho, DS Cho, MC Choi, JG Kim, JY Lim, Y Jung, JC Ahn, ... Japanese journal of applied physics 38 (10R), 6073, 1999 | 29 | 1999 |
| Investigation and optimization of the magnetic field configuration in high-power impulse magnetron sputtering H Yu, L Meng, MM Szott, JT McLain, TS Cho, DN Ruzic Plasma sources science and technology 22 (4), 045012, 2013 | 28 | 2013 |
| Characteristic properties of fluorescent lamps operated using capacitively coupled electrodes TS Cho, HS Kim, YG Kim, JJ Ko, JG Kang, EH Choi, G Cho, HS Uhm Japanese journal of applied physics 41 (12R), 7518, 2002 | 28 | 2002 |
| Laser-assisted plasma coating at atmospheric pressure: production of yttria-stabilized zirconia thermal barriers Z Ouyang, L Meng, P Raman, TS Cho, DN Ruzic Journal of Physics D: Applied Physics 44 (26), 265202, 2011 | 23 | 2011 |
| Deposition of aluminum oxide by evaporative coating at atmospheric pressure (ECAP) YL Wu, J Hong, D Peterson, J Zhou, TS Cho, DN Ruzic Surface and Coatings Technology 237, 369-378, 2013 | 21 | 2013 |
| Influence of sustaining pulse-width on electro-luminous efficiency in AC plasma display panels TS Cho, JJ Ko, DI Kim, CW Lee, G Cho, EH Choi Japanese Journal of Applied Physics 39 (7R), 4176, 2000 | 21 | 2000 |
| Conductivity and ion density of a plasma channel induced by a mildly relativistic electron beam from a gas-filled diode EH Choi, JJ Ko, MC Choi, TS Cho, Y Jung, DI Kim, Y Seo, GS Cho, ... Physics of Plasmas 5 (5), 1514-1521, 1998 | 20 | 1998 |
| Apparatus and method for depositing a coating on a substrate at atmospheric pressure DN Ruzic, Y Wu, I Shchelkanov, J Hong, Z Ouyang, TS Cho US Patent 10,167,556, 2019 | 18 | 2019 |
| Capillary plasma electrode discharge as an intense and efficient source of vacuum ultraviolet radiation for plasma display SH Park, TS Cho, KH Becker, EE Kunhardt IEEE transactions on plasma science 37 (8), 1611-1614, 2009 | 17 | 2009 |
| Three-dimensional spatiotemporal behaviors of light emission from discharge plasma of alternating current plasma display panels TS Cho, GH Chung, JW Jung Applied Physics Letters 92 (22), 2008 | 17 | 2008 |
| Plasma propagation speed and electron temperature in surface-discharged alternating-current plasma display panels JC Ahn, SB Kim, TS Cho, MC Choi, DG Joh, MW Moon, YH Seo, SO Kang, ... Japanese journal of applied physics 41 (2R), 860, 2002 | 17 | 2002 |
| Electrical and optical characteristics of cylindrical non-thermal atmospheric-pressure dielectric barrier discharge plasma sources YL Wu, J Hong, Z Ouyang, TS Cho, DN Ruzic Surface and Coatings Technology 234, 100-103, 2013 | 15 | 2013 |
