| Tungsten passivation layer (WO3) formation mechanisms during chemical mechanical planarization in the presence of oxidizers MK Poddar, P Jalalzai, S Sahir, NP Yerriboina, TG Kim, JG Park Applied Surface Science 537, 147862, 2021 | 19 | 2021 |
| Sodium phosphate post-treatment on Al coating: Morphological and corrosion study HR Jeong, HS Lee, P Jalalzai, SJ Kwon, JK Singh, RR Hussain, ... Journal of Thermal Spray Technology 28, 1511-1531, 2019 | 11 | 2019 |
| Benzethonium chloride as a tungsten corrosion inhibitor in neutral and alkaline media for the post-chemical mechanical planarization application RP Meethal, P Jalalzai, S Kumar, J Peter, A Klipp, TG Kim, JG Park Journal of Colloid and Interface Science 643, 465-479, 2023 | 3 | 2023 |
| Effect of slurry particles on PVA brush contamination during post-CMP cleaning S Sahir, HW Cho, P Jalalzai, S Samanta, S Hamada, TG Kim, JG Park Materials Science in Semiconductor Processing 151, 107043, 2022 | 3 | 2022 |
| Effect of Slurry Additives on Co-BTA Complex Stability and Inhibition Property During Co CMP Process P Jalalzai, HY Ryu, S Sahir, RP Meethal, S Hamada, TG Kim, JG Park ECS Journal of Solid State Science and Technology 11 (8), 084006, 2022 | 3 | 2022 |
| Effect of Dissolved Oxygen on Removal of Benzotriazole from Co during a Post-Co CMP Cleaning HY Ryu, P Jalalzai, NP Yerriboina, TG Kim, S Hamada, JG Park Solid State Phenomena 314, 270-274, 2021 | 1 | 2021 |
| Effect of Skin Layer on Brush Loading, Cross-Contamination, and Cleaning Performance during Post-CMP Cleaning S Sahir, HW Cho, P Jalalzai, J Peter, R Singh, S Hamada, TG Kim, ... ECS Journal of Solid State Science and Technology 11 (5), 054003, 2022 | | 2022 |
| Electrochemical investigations on the corrosion and inhibition during W post-CMP cleaning RP Meethal, P Jalalzai, S Kumar, TG Kim, W Cho, A Klipp, JG Park | | |
