| Machine learning aided process control: critical dimension uniformity control of etching process in 1z nm DRAM T Jo, I Choi, D Choi, Y Bae, S Byoun, I Kim, S Lee, C Choi, E Kum, Y Kang, ... Metrology, Inspection, and Process Control for Semiconductor Manufacturing …, 2021 | 1 | 2021 |
