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Dr. Prem Pal
Dr. Prem Pal
Professor, Dept. of Physics, IIT Hyderabad, India
Verified email at iith.ac.in - Homepage
Title
Cited by
Cited by
Year
Fabrication techniques of convex corners in a (1 0 0)-silicon wafer using bulk micromachining: a review
P Pal, K Sato, S Chandra
Journal of Micromechanics and Microengineering 17 (10), R111, 2007
1232007
A comprehensive review on convex and concave corners in silicon bulk micromachining based on anisotropic wet chemical etching
P Pal, K Sato
Micro and Nano Systems Letters 3, 1-42, 2015
1182015
Various shapes of silicon freestanding microfluidic channels and microstructures in one-step lithography
P Pal, K Sato
Journal of Micromechanics and Microengineering 19 (5), 055003, 2009
822009
Study of corner compensating structures and fabrication of various shapes of MEMS structures in pure and surfactant added TMAH
P Pal, K Sato, M Shikida, MA Gosálvez
Sensors and actuators A: Physical 154 (2), 192-203, 2009
812009
Study of rounded concave and sharp edge convex corners undercutting in CMOS compatible anisotropic etchants
P Pal, K Sato, MA Gosalvez, M Shikida
Journal of Micromechanics and Microengineering 17 (11), 2299, 2007
802007
Orientation-and concentration-dependent surfactant adsorption on silicon in aqueous alkaline solutions: explaining the changes in the etch rate, roughness and undercutting for …
MA Gosalvez, B Tang, P Pal, K Sato, Y Kimura, K Ishibashi
Journal of Micromechanics and Microengineering 19 (12), 125011, 2009
762009
Surfactant Adsorption on Single-Crystal Silicon Surfaces in TMAH Solution: Orientation-Dependent Adsorption Detected by In Situ Infrared Spectroscopy
P Pal, K Sato, MA Gosalvez, Y Kimura, KI Ishibashi, M Niwano, H Hida, ...
Journal of microelectromechanical systems 18 (6), 1345-1356, 2009
722009
Fabrication methods based on wet etching process for the realization of silicon MEMS structures with new shapes
P Pal, K Sato
Microsystem technologies 16, 1165-1174, 2010
662010
High speed silicon wet anisotropic etching for applications in bulk micromachining: a review
P Pal, V Swarnalatha, AVN Rao, AK Pandey, H Tanaka, K Sato
Micro and Nano Systems Letters 9, 1-59, 2021
572021
Silicon Wet Bulk Micromachining for MEMS
P Pal, K Sato
Pan Stanford Publishing Pte Ltd, Singapore 1, 424, 2017
572017
Study of structural effect on Eu-substituted LSMO manganite for high temperature coefficient of resistance
S Vadnala, TD Rao, P Pal, S Asthana
Physica B: Condensed Matter 448, 277-280, 2014
572014
Etching characteristics of Si {110} in 20 wt% KOH with addition of hydroxylamine for the fabrication of bulk micromachined MEMS
AVN Rao, V Swarnalatha, P Pal
Micro and Nano Systems Letters 5, 1-9, 2017
532017
Complex three-dimensional structures in Si {1 0 0} using wet bulk micromachining
P Pal, K Sato
Journal of Micromechanics and Microengineering 19 (10), 105008, 2009
532009
Interface study of bonded wafers by digitized linear frequency modulated thermal wave imaging
R Mulaveesala, P Pal, S Tuli
Sensors and Actuators A: Physical 128 (1), 209-216, 2006
522006
Nano-structured ZnO films by sol-gel process
H Bahadur, AK Srivastava, D Haranath, H Chander, A Basu, SB Samanta, ...
CSIR, 2007
512007
Experimental procurement of the complete 3D etch rate distribution of Si in anisotropic etchants based on vertically micromachined wagon wheel samples
MA Gosalvez, P Pal, N Ferrando, H Hida, K Sato
Journal of Micromechanics and Microengineering 21 (12), 125007, 2011
502011
Ellipsometry study of the adsorbed surfactant thickness on Si {1 1 0} and Si {1 0 0} and the effect of pre-adsorbed surfactant layer on etching characteristics in TMAH
B Tang, P Pal, MA Gosalvez, M Shikida, K Sato, H Amakawa, S Itoh
Sensors and Actuators A: Physical 156 (2), 334-341, 2009
502009
Fabrication of novel microstructures based on orientation-dependent adsorption of surfactant molecules in a TMAH solution
P Pal, K Sato, MA Gosalvez, B Tang, H Hida, M Shikida
Journal of Micromechanics and Microengineering 21 (1), 015008, 2010
492010
Silicon micromachining based on surfactant-added tetramethyl ammonium hydroxide: etching mechanism and advanced applications
P Pal, MA Gosalvez, K Sato
Japanese Journal of Applied Physics 49 (5R), 056702, 2010
432010
Anisotropic etching in low‐concentration KOH: effects of surfactant concentration
P Pal, A Ashok, S Haldar, Y Xing, K Sato
Micro & Nano Letters 10 (4), 224-228, 2015
372015
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