Thermally Grown TiO2and Al2O3for GaN-Based MOS-HEMTs A Rawat, M Meer, V kumar Surana, N Bhardwaj, V Pendem, ... IEEE Transactions on Electron Devices 65 (9), 3725-3731, 2018 | 40 | 2018 |
Realization of high quality silicon nitride deposition at low temperatures VK Surana, N Bhardwaj, A Rawat, Y Yadav, S Ganguly, D Saha Journal of Applied Physics 126 (11), 2019 | 29 | 2019 |
Gate Current Reduction and Improved DC/RF Characteristics in GaN-Based MOS-HEMTs Using Thermally Grown TiO2 as a Dielectric A Rawat, VK Surana, M Meer, N Bhardwaj, S Ganguly, D Saha IEEE Transactions on Electron Devices 66 (6), 2557-2562, 2019 | 22 | 2019 |
Performance Improvement in AlGaN/GaN High‐Electron‐Mobility Transistors by Low‐Temperature Inductively Coupled Plasma–Chemical Vapor Deposited SiN x as Gate Dielectric and … VK Surana, S Ganguly, D Saha physica status solidi (a) 219 (24), 2200509, 2022 | 3 | 2022 |
Tensile strain and Fermi level alignment in thermally grown TiO2 and Al2O3 based AlGaN/GaN MOS-HEMTs A Rawat, VK Surana, S Ganguly, D Saha Solid-State Electronics 164, 107702, 2020 | 2 | 2020 |