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Dr. Deepak Kumar Sharma
Dr. Deepak Kumar Sharma
Scientst at ISRO
Verified email at leos.gov.in
Title
Cited by
Cited by
Year
Effect of electrical stress on Au/Pb (Zr0.52Ti0.48) O3/TiOxNy/Si gate stack for reliability analysis of ferroelectric field effect transistors
R Khosla, DK Sharma, K Mondal, SK Sharma
Applied Physics Letters 105 (15), 152907, 2014
182014
Multilevel metal/Pb (Zr0. 52Ti0. 48) O3/TiOxNy/Si for next generation FeRAM technology node
DK Sharma, R Khosla, SK Sharma
Solid-State Electronics 111, 42-46, 2015
152015
Instrument for Lunar Seismic Activity Studies on Chandrayaan-2 Lander.
J John, V Thamarai, MM Mehra, T Choudhary, MS Giridhar, ...
Current Science (00113891) 118 (3), 2020
12020
Field Stress Influenced Conduction Behavior of Narrow Diameter Gate-All-Around (GAA) Silicon Nanowire n-MOSFET
DK Sharma, RK Goud, A Datta, S Manhas
Journal of Electronic Materials 48 (12), 7674-7679, 2019
12019
Rate limited filament formation in Al-ZnO-Al bipolar ReRAM cells and its impact on early current window closure during cycling
AD Amit Kumar Singh Chauhan, Deepak K. Sharma
Journal of Applied Physics 125, 104503, 2019
12019
Impact of Varying Strain Energy in Oxide on Random Telegraph Noise and Associated Time Constants in Silicon Nanowire pMOSFETs
DK Sharma, A Datta
IEEE Transactions on Electron Devices 66 (3), 1489 - 1494, 2019
12019
High performance Au/PZT/TiOxNy/Si MFIS structure for next generation ferroelectric memory applications
DK Sharma, R Khosla, SK Sharma
AIP Conference Proceedings 1661 (1), 060007, 2015
12015
Design and development of broadband DC-10 GHz packaged RF MEMS switches with on chip CPW-microstrip transitions
S Singh, MS Giridhar, A Jambhalikar, TK Pratheek, S Gogulapati, ...
Sādhanā 47 (2), 1-14, 2022
2022
Process Development for Very Deep Etching of Silicon Using Two Layer Masks for Fabrication of Mechanically Decoupled MEMS Gyroscope
DK Sharma, J John, G Supriya, A Jambhalikar, MS Giridhar
2021 25th International Symposium on VLSI Design and Test (VDAT), 2021
2021
Oxide Edge Trap Density Extraction in Silicon Nanowire MOSFET from Tunnel Current Noise Measurement in Gated Diode like Arrangement
AD D. K. Sharma
IEEE Transactions on Device and Materials Reliability, 2020
2020
Computational Study on Ion dynamics of MEMS Quadrupole Mass Filter
AJ Anitha. B., Supriya Gogulapati, Deepak Kumar Sharma, John. J., Giridhar ...
NCMST 2020, 2020
2020
EXPERIMENTAL INVESTIGATION OF MEMS BASED MICRO HEAT PIPE WITH INFRA RED CAMERA
JKB Hriday Datha, Ashwini Jambhalikar,Shubajit Biswas, J. John, M. S ...
ISSS 2019, 2019
2019
Reliability evaluation of erbium oxide thin films as a gate dielectric for CMOS technology
DKSSKS Robin Khosla*
Proceedings of the International Conference On: Multifunctional Materials …, 2014
2014
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