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Padraig Dunne
Padraig Dunne
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Cited by
Year
Rare-earth plasma extreme ultraviolet sources at 6.5–6.7 nm
T Otsuka, D Kilbane, J White, T Higashiguchi, N Yugami, T Yatagai, ...
Applied Physics Letters 97 (11), 2010
1212010
Spectroscopy of highly charged ions and its relevance to EUV and soft x-ray source development
G O’Sullivan, B Li, R D’Arcy, P Dunne, P Hayden, D Kilbane, ...
Journal of Physics B: Atomic, Molecular and Optical Physics 48 (14), 144025, 2015
1202015
Simplified modeling of 13.5 nm unresolved transition array emission of a Sn plasma and comparison with experiment
J White, P Hayden, P Dunne, A Cummings, N Murphy, P Sheridan, ...
Journal of Applied Physics 98 (11), 2005
922005
Optimizing 13.5 nm laser-produced tin plasma emission as a function of laser wavelength
J White, P Dunne, P Hayden, F O’Reilly, G O’sullivan
Applied Physics Letters 90 (18), 2007
912007
Feasibility study of broadband efficient “water window” source
T Higashiguchi, T Otsuka, N Yugami, W Jiang, A Endo, B Li, P Dunne, ...
Applied Physics Letters 100 (1), 2012
902012
13.5 nm extreme ultraviolet emission from tin based laser produced plasma sources
P Hayden, A Cummings, N Murphy, G O’Sullivan, P Sheridan, J White, ...
Journal of applied physics 99 (9), 2006
882006
Extreme ultraviolet source at 6.7 nm based on a low-density plasma
T Higashiguchi, T Otsuka, N Yugami, W Jiang, A Endo, B Li, D Kilbane, ...
Applied Physics Letters 99 (19), 2011
822011
The photoabsorption spectrum of an indium laser produced plasma
G Duffy, P Dunne
Journal of Physics B: Atomic, Molecular and Optical Physics 34 (6), L173, 2001
822001
Systematic investigation of self-absorption and conversion efficiency of 6.7 nm extreme ultraviolet sources
T Otsuka, D Kilbane, T Higashiguchi, N Yugami, T Yatagai, W Jiang, ...
Applied Physics Letters 97 (23), 2010
742010
4d→ 5p transitions in the extreme ultraviolet photoabsorption spectra of Sn II and Sn III
G Duffy, P van Kampen, P Dunne
Journal of Physics B: Atomic, Molecular and Optical Physics 34 (15), 3171, 2001
652001
Optimizing conversion efficiency and reducing ion energy in a laser-produced Gd plasma
T Cummins, T Otsuka, N Yugami, W Jiang, A Endo, B Li, C O’Gorman, ...
Applied Physics Letters 100 (6), 2012
622012
UTA versus line emission for EUVL: studies on xenon emission at the NIST EBIT
K Fahy, P Dunne, L McKinney, G O'Sullivan, E Sokell, J White, A Aguilar, ...
Journal of Physics D: Applied Physics 37 (23), 3225, 2004
602004
Quasi-Moseley's law for strong narrow bandwidth soft x-ray sources containing higher charge-state ions
H Ohashi, T Higashiguchi, Y Suzuki, G Arai, Y Otani, T Yatagai, B Li, ...
Applied Physics Letters 104 (23), 2014
592014
Characteristics of extreme ultraviolet emission from mid-infrared laser-produced rare-earth Gd plasmas
T Higashiguchi, B Li, Y Suzuki, M Kawasaki, H Ohashi, S Torii, ...
Optics Express 21 (26), 31837-31845, 2013
562013
Opacity of neutral and low ion stages of Sn at the wavelength 13.5 nm used in extreme-ultraviolet lithography
M Lysaght, D Kilbane, N Murphy, A Cummings, P Dunne, G O’Sullivan
Physical Review A 72 (1), 014502, 2005
552005
Conversion efficiency of a laser-produced Sn plasma at 13.5 nm, simulated with a one-dimensional hydrodynamic model and treated as a multi-component blackbody
A Cummings, G O'Sullivan, P Dunne, E Sokell, N Murphy, J White
Journal of Physics D: Applied Physics 38 (4), 604, 2005
532005
Variable composition laser-produced Sn plasmas—a study of their time-independent ion distributions
A Cummings, G O'sullivan, P Dunne, E Sokell, N Murphy, J White, K Fahy, ...
Journal of Physics D: Applied Physics 37 (17), 2376, 2004
44*2004
Prepulse-enhanced narrow bandwidth soft x-ray emission from a low debris, subnanosecond, laser plasma source
P Dunne, G O’sullivan, D O’Reilly
Applied Physics Letters 76 (1), 34-36, 2000
432000
Angular emission and self-absorption studies of a tin laser produced plasma extreme ultraviolet source between 10 and 18nm
O Morris, F O’Reilly, P Dunne, P Hayden
Applied Physics Letters 92 (23), 2008
422008
Gd plasma source modeling at 6.7 nm for future lithography
B Li, P Dunne, T Higashiguchi, T Otsuka, N Yugami, W Jiang, A Endo, ...
Applied Physics Letters 99 (23), 2011
392011
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