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Ramanathan Srinivasan
Ramanathan Srinivasan
Department of Chemical Engineering, Indian Institute of Technology - Madras, India
Verified email at iitm.ac.in - Homepage
Title
Cited by
Cited by
Year
Microwave food processing—A review
S Chandrasekaran, S Ramanathan, T Basak
Food research international 52 (1), 243-261, 2013
7702013
Microwave material processing—a review
S Chandrasekaran, S Ramanathan, T Basak
AIChE Journal 58 (2), 330-363, 2012
2832012
Experimental and theoretical investigation on microwave melting of metals
S Chandrasekaran, T Basak, S Ramanathan
Journal of Materials Processing Technology 211 (3), 482-487, 2011
1412011
Chemical mechanical planarization of copper in alkaline slurry with uric acid as inhibitor
YN Prasad, S Ramanathan
Electrochimica Acta 52 (22), 6353-6358, 2007
822007
Microwave heating characteristics of graphite based powder mixtures
S Chandrasekaran, T Basak, R Srinivasan
International Communications in Heat and Mass Transfer 48, 22-27, 2013
812013
Amino acid or carboxylic acid with halide functional group
R Srinivasan, SV Babu, WG America, YS Her, EK Company, C University, ...
US Patent 6,491,843, 2002
63*2002
Shallow trench isolation chemical mechanical planarization: a review
R Srinivasan, PVR Dandu, SV Babu
ECS Journal of Solid State Science and Technology 4 (11), P5029, 2015
592015
Nonlinear electrochemical impedance spectroscopy
F Fasmin, R Srinivasan
Journal of The Electrochemical Society 164 (7), H443, 2017
562017
Slurry for chemical mechanical polishing silicon dioxide
R Srinivasan, SV Babu, WG America, YS Her
US Patent 6,468,910, 2002
532002
The effect of hydrogen peroxide on polishing removal rate in CMP with various abrasives
R Manivannan, S Ramanathan
Applied Surface Science 255 (6), 3764-3768, 2009
512009
Characterization of TMAH based cleaning solution for post Cu-CMP application
RP Venkatesh, TY Kwon, YN Prasad, S Ramanathan, JG Park
Microelectronic Engineering 102, 74-80, 2013
482013
Effect of potential drifts and ac amplitude on the electrochemical impedance spectra
SN Victoria, S Ramanathan
Electrochimica Acta 56 (5), 2606-2615, 2011
472011
Slurry for chemical mechanical polishing silicon dioxide
R Srinivasan, SV Babu, WG America, YS Her
US Patent 6,468,910, 2002
432002
Facile synthesis of palladium nanoclusters and their catalytic activity in Sonogashira coupling reactions
J Athilakshmi, S Ramanathan, DK Chand
Tetrahedron Letters 49 (36), 5286-5288, 2008
402008
Potassium bromate as an oxidizing agent in a titania-based Ru CMP slurry
SN Victoria, PP Sharma, II Suni, S Ramanathan
Electrochemical and Solid-State Letters 13 (11), H385, 2010
382010
A kinetic model for the anodic dissolution of Ti in HF in the active and passive regions
F Fasmin, BVS Praveen, R Srinivasan
Journal of The electrochemical society 162 (9), H604-H610, 2015
372015
Characterization of non-amine-based post-copper chemical mechanical planarization cleaning solution
R Manivannan, BJ Cho, X Hailin, S Ramanathan, JG Park
Microelectronic engineering 122, 33-39, 2014
372014
Chemical mechanical planarization of ruthenium with oxone as oxidizer
SN Victoria, J Jebaraj, II Suni, S Ramanathan
Electrochemical and Solid-State Letters 15 (3), H55, 2011
372011
Role of abrasives in high selectivity STI CMP slurries
R Manivannan, S Ramanathan
Microelectronic Engineering 85 (8), 1748-1753, 2008
362008
Kinetic analysis of Au deposition from aqueous HF onto Si (111) by surface second harmonic generation
R Srinivasan, II Suni
Journal of The Electrochemical Society 146 (2), 570, 1999
331999
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