| Focused helium and neon ion beam induced etching for advanced extreme ultraviolet lithography mask repair CM Gonzalez, R Timilsina, G Li, G Duscher, PD Rack, W Slingenbergh, ... Journal of Vacuum Science & Technology B 32 (2), 2014 | 41 | 2014 |
| Evaluation of mask repair strategies via focused electron, helium, and neon beam induced processing for EUV applications CM Gonzalez, W Slingenbergh, R Timilsina, JH Noh, MG Stanford, ... Extreme Ultraviolet (EUV) Lithography V 9048, 135-141, 2014 | 19 | 2014 |
| Selective functionalization of tailored nanostructures W Slingenbergh, SK de Boer, T Cordes, WR Browne, BL Feringa, ... ACS nano 6 (10), 9214-9220, 2012 | 18 | 2012 |
| Selective functionalization of patterned glass surfaces E Ploetz, B Visser, W Slingenbergh, K Evers, D Martinez-Martinez, YT Pei, ... Journal of Materials Chemistry B 2 (17), 2606-2615, 2014 | 15 | 2014 |
| The selective functionalization of small electron-beam-induced SiOx deposits by self-assembly W Slingenbergh Faculty of Science and Engineering, 2012 | | 2012 |
Kate L. KleinNIST & The University of the District of ColumbiaVerified email at nist.gov
