| Full color generation using silver tandem nanodisks H Wang, X Wang, C Yan, H Zhao, J Zhang, C Santschi, OJF Martin ACS nano 11 (5), 4419-4427, 2017 | 208 | 2017 |
| Strong improvement of long‐term chemical and thermal stability of plasmonic silver nanoantennas and films X Wang, C Santschi, OJF Martin small 13 (28), 1700044, 2017 | 61 | 2017 |
| Twisting fluorescence through extrinsic chiral antennas C Yan, X Wang, TV Raziman, OJF Martin Nano letters 17 (4), 2265-2272, 2017 | 38 | 2017 |
| Progress in EUV resists towards high-NA EUV lithography X Wang, Z Tasdemir, I Mochi, M Vockenhuber, L van Lent-Protasova, ... Extreme Ultraviolet (EUV) Lithography X 10957, 19-27, 2019 | 30 | 2019 |
| Evaluation of EUV resists for 5nm technology node and beyond Z Tasdemir, X Wang, I Mochi, L van Lent-Protasova, M Meeuwissen, ... International conference on extreme ultraviolet lithography 2018 10809, 85-94, 2018 | 19 | 2018 |
| Progress in EUV resist screening towards the deployment of high-NA lithography T Allenet, X Wang, M Vockenhuber, CK Yeh, I Mochi, JG SantaClara, ... Extreme Ultraviolet (EUV) Lithography XII 11609, 34-43, 2021 | 18 | 2021 |
| Progress in EUV resists status towards high-NA EUV lithography X Wang, LT Tseng, T Allenet, I Mochi, M Vockenhuber, CK Yeh, ... Extreme Ultraviolet (EUV) Lithography XI 11323, 56-66, 2020 | 12 | 2020 |
| Studying resist performance for contact holes printing using EUV interference lithography XWLTTDKZTMVIMY Ekinci J. Micro/Nanolith. MEMS MOEMS 18, 013501, 2019 | 10 | 2019 |
| Revisiting Newton’s rings with a plasmonic optical flat for high-accuracy surface inspection Y Zheng, J Bian, XL Wang, JX Liu, P Feng, HX Ge, OJF Martin, WH Zhang Light: Science & Applications 5 (10), e16156-e16156, 2016 | 10 | 2016 |
| Sub-20 nm Si fins with high aspect ratio via pattern transfer using fullerene-based spin-on-carbon hard masks LT Tseng, D Kazazis, X Wang, CM Popescu, APG Robinson, Y Ekinci Microelectronic Engineering 210, 8-13, 2019 | 9 | 2019 |
| High-efficiency diffraction gratings for EUV and soft x-rays using spin-on-carbon underlayers X Wang, D Kazazis, LT Tseng, APG Robinson, Y Ekinci Nanotechnology 33 (6), 065301, 2021 | 7 | 2021 |
| Progress in EUV resists for contact holes printing using EUV interference lithography X Wang, LT Tseng, I Mochi, M Vockenhuber, L van Lent-Protasova, ... 35th European Mask and Lithography Conference (EMLC 2019) 11177, 111-118, 2019 | 2 | 2019 |
| Progress overview of EUV resists status towards high-NA EUV lithography X Wang, LT Tseng, I Mochi, M Vockenhuber, L van Lent-Protasova, ... International Conference on Extreme Ultraviolet Lithography 2019 11147, 103-112, 2019 | 1 | 2019 |
| Photomask X Wang, LT Tseng, D Kazazis, Z Tasdemir, M Vockenhuber, I Mochi, ... | | 2019 |
| Multimode metasurfaces: from direct observation of the phase front to advanced optical functions (Conference Presentation) C Yan, X Wang, KY Yang, L Driencourt, TV Raziman, OJF Martin Plasmonics: Design, Materials, Fabrication, Characterization, and …, 2017 | | 2017 |
| Advanced Plasmonic Nanostructures for Engineering Fluorescence Applications X Wang EPFL, 2017 | | 2017 |
| Advanced Fano-resonant Plasmonic Nanostructures for Fluorescence Enhancement X Wang, OJF Martin PicoQuant workshop, 2014 | | 2014 |
Olivier J.F. MartinProfessor of Nanophotonics & Optical Signal Processing, EPFLVerified email at epfl.ch
