| Atomic Layer Deposition of an Indium Gallium Oxide Thin Film for Thin-Film Transistor Applications J Sheng, EJ Park, B Shong, JS Park ACS Applied Materials & Interfaces 9 (28), 23934-23940, 2017 | 108 | 2017 |
| Area-selective Atomic Layer Deposition using Si Precursors as Inhibitors R Khan, B Shong, BG Ko, JK Lee, H Lee, JY Park, IK Oh, SS Raya, ... Chemistry of Materials 30 (21), 7603–7610, 2018 | 101 | 2018 |
| Finite-size effects in O and CO adsorption for the late transition metals AA Peterson, LC Grabow, TP Brennan, B Shong, C Ooi, DM Wu, CW Li, ... Topics in Catalysis 55 (19-20), 1276-1282, 2012 | 82 | 2012 |
| Highly Conductive and Flexible Fiber for Textile Electronics Obtained by Extremely Low-Temperature Atomic Layer Deposition of Pt J Lee, J Yoon, HG Kim, S Kang, WS Oh, H Algadi, S Al-Sayari, B Shong, ... NPG Asia Materials 8, e331, 2016 | 64 | 2016 |
| Low temperature atomic layer deposition of SiO2 thin films using di-isopropylaminosilane and ozone YS Lee, D Choi, B Shong, S Oh, JS Park Ceramics International 43 (2), 2095-2099, 2017 | 60 | 2017 |
| Atomic and Molecular Adsorption on the Bi(111) Surface: Insights into Catalytic CO2 Reduction W Oh, CK Rhee, JW Han, B Shong The Journal of Physical Chemistry C 122 (40), 23084–23090, 2018 | 53 | 2018 |
| Effects of Al Precursors on Deposition Selectivity of Atomic Layer Deposition of Al2O3 using Ethanethiol Inhibitor HG Kim, M Kim, B Gu, MR Khan, BG Ko, S Yasmeen, CS Kim, SH Kwon, ... Chemistry of Materials 32 (20), 8921–8929, 2020 | 49 | 2020 |
| Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices MZ Ansari, DK Nandi, P Janicek, SA Ansari, R Ramesh, T Cheon, ... ACS Applied Materials & Interfaces 11 (46), 43608-43621, 2019 | 47 | 2019 |
| Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications S Yeo, DK Nandi, R Rahul, TH Kim, B Shong, Y Jang, JS Bae, JW Han, ... Applied Surface Science 459, 596-605, 2018 | 47 | 2018 |
| Inherently Area-Selective Atomic Layer Deposition of SiO2 Thin Films to Confer Oxide Versus Nitride Selectivity J Lee, JM Lee, H Oh, C Kim, J Kim, DH Kim, B Shong, TJ Park, WH Kim Advanced Functional Materials 31 (33), 2102556, 2021 | 43 | 2021 |
| Thermal Atomic Layer Deposition of Device-Quality SiO2 Thin Films under 100 °C Using an Aminodisilane Precursor DH Kim, HJ Lee, H Jeong, B Shong, WH Kim, TJ Park Chemistry of Materials 31 (15), 5502-5508, 2019 | 41 | 2019 |
| Anti–corrosive FeO decorated CuCo2S4 as an efficient and durable electrocatalyst for hydrogen evolution reaction ATA Ahmed, AS Ansari, SM Pawar, B Shong, H Kim, H Im Applied Surface Science 539, 148229, 2021 | 40 | 2021 |
| In Vacuo Photoemission Studies of Platinum Atomic Layer Deposition Using Synchrotron Radiation SM Geyer, R Methaapanon, B Shong, PA Pianetta, SF Bent The Journal of Physical Chemistry Letters 4 (1), 176-179, 2013 | 35 | 2013 |
| Molecular oxidation of surface –CH3 during atomic layer deposition of Al2O3 with H2O, H2O2, and O3: A theoretical study S Seo, T Nam, HBR Lee, H Kim, B Shong Applied Surface Science 457, 376-380, 2018 | 31 | 2018 |
| Synthesis of a Hybrid Nanostructure of ZnO-Decorated MoS2 by Atomic Layer Deposition IK Oh, WH Kim, L Zeng, J Singh, D Bae, AJM Mackus, JG Song, S Seo, ... ACS Nano 14 (2), 1757-1769, 2020 | 28 | 2020 |
| Adsorption of gas molecules on graphene, silicene, and germanene: A comparative first-principles study SS Raya, AS Ansari, B Shong Surfaces and Interfaces 24, 101054, 2021 | 27 | 2021 |
| Atomic Layer Deposition of Ru for Replacing Cu-Interconnects Y Kotsugi, SM Han, YH Kim, T Cheon, DK Nandi, R Ramesh, NK Yu, ... Chemistry of Materials 33 (14), 5639–5651, 2021 | 26 | 2021 |
| Formic acid electrooxidation activity of Pt and Pt/Au catalysts: Effects of surface physical properties and irreversible adsorption of Bi JK Yoo, M Choi, S Yang, B Shong, HS Chung, Y Sohn, CK Rhee Electrochimica Acta 273, 307-317, 2018 | 26 | 2018 |
| Self-Assembly of Acetate Adsorbates Drives Atomic Rearrangement on the Au(110) Surface F Hiebel, B Shong, W Chen, RJ Madix, E Kaxiras, CM Friend Nature Communications 7, 13139, 2016 | 26 | 2016 |
| Wafer-Scale Growth of a MoS2 Monolayer via One Cycle of Atomic Layer Deposition: An Adsorbate Control Method DH Kim, JC Park, J Park, DY Cho, WH Kim, B Shong, JH Ahn, TJ Park Chemistry of Materials 33 (11), 4099-4105, 2021 | 25 | 2021 |
