Hyeongtag Jeon
Hyeongtag Jeon
Verified email at hanyang.ac.kr - Homepage
Title
Cited by
Cited by
Year
Morphology and phase stability of TiSi2 on Si
H Jeon, CA Sukow, JW Honeycutt, GA Rozgonyi, RJ Nemanich
Journal of applied physics 71 (9), 4269-4276, 1992
2701992
Apparatus for generating remote plasma
H Jeon, I Kim, S Kim, C Chung, S Lee
US Patent App. 11/703,621, 2007
1802007
Formation of nanocrystalline Fe–Co powders produced by mechanical alloying
Y Do Kim, JY Chung, J Kim, H Jeon
Materials Science and Engineering: A 291 (1-2), 17-21, 2000
1422000
Characteristics of the ZnO thin film transistor by atomic layer deposition at various temperatures
S Kwon, S Bang, S Lee, S Jeon, W Jeong, H Kim, SC Gong, HJ Chang, ...
Semiconductor science and technology 24 (3), 035015, 2009
1332009
Apparatus for generating remote plasma
H Jeon, S Woo, H Kim, C Chung
US Patent 8,207,470, 2012
1172012
Atomic layer deposition and biocompatibility of titanium nitride nano-coatings on cellulose fiber substrates
GK Hyde, SD McCullen, S Jeon, SM Stewart, H Jeon, EG Loboa, ...
Biomedical materials 4 (2), 025001, 2009
1002009
Hydrogen-reduction behavior and microstructural characteristics of WO3–CuO powder mixtures with various milling time
DG Kim, ST Oh, H Jeon, CH Lee, Y Do Kim
Journal of alloys and compounds 354 (1-2), 239-242, 2003
952003
History of atomic layer deposition and its relationship with the American Vacuum Society
GN Parsons, JW Elam, SM George, S Haukka, H Jeon, WMM Kessels, ...
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 31 (5 …, 2013
942013
Microstructure and magnetic properties of nanosized Fe–Co alloy powders synthesized by mechanochemical and mechanical alloying process
BH Lee, BS Ahn, DG Kim, ST Oh, H Jeon, J Ahn, Y Do Kim
Materials Letters 57 (5-6), 1103-1107, 2003
882003
Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
JY Kim, S Seo, DY Kim, H Jeon, Y Kim
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 22 (1 …, 2004
872004
Study on the characteristics of TiN thin film deposited by the atomic layer chemical vapor deposition method
H Jeon, JW Lee, YD Kim, DS Kim, KS Yi
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 18 (4 …, 2000
842000
Characteristics of gate dielectric deposited using Zr t–butoxide and precursors by plasma enhanced atomic layer deposition method
Y Kim, J Koo, J Han, S Choi, H Jeon, CG Park
Journal of applied physics 92 (9), 5443-5447, 2002
832002
Photocurrent detection of chemically tuned hierarchical ZnO nanostructures grown on seed layers formed by atomic layer deposition
S Bang, S Lee, Y Ko, J Park, S Shin, H Seo, H Jeon
Nanoscale research letters 7 (1), 1-11, 2012
822012
Structural and electrical properties of ZnO thin films deposited by atomic layer deposition at low temperatures
S Jeon, S Bang, S Lee, S Kwon, W Jeong, H Jeon, HJ Chang, HH Park
Journal of the Electrochemical Society 155 (10), H738, 2008
782008
Ultrathin alumina-coated carbon nanotubes as an anode for high capacity Li-ion batteries
I Lahiri, SM Oh, JY Hwang, C Kang, M Choi, H Jeon, R Banerjee, YK Sun, ...
Journal of Materials Chemistry 21 (35), 13621-13626, 2011
762011
Tuning the electronic structure of tin sulfides grown by atomic layer deposition
G Ham, S Shin, J Park, H Choi, J Kim, YA Lee, H Seo, H Jeon
ACS applied materials & interfaces 5 (18), 8889-8896, 2013
742013
Characteristics of thin films grown by plasma atomic layer deposition
J Kim, S Kim, H Jeon, MH Cho, KB Chung, C Bae
Applied Physics Letters 87 (5), 053108, 2005
732005
A study on H2 plasma treatment effect on a-IGZO thin film transistor
J Kim, S Bang, S Lee, S Shin, J Park, H Seo, H Jeon
Journal of Materials Research 27 (17), 2318, 2012
692012
The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
S Lee, S Bang, J Park, S Park, W Jeong, H Jeon
physica status solidi (a) 207 (8), 1845-1849, 2010
692010
Characteristics of Al 2O 3 thin films deposited using dimethylaluminum isopropoxide and trimethylaluminum precursors by the plasma-enhanced atomic-layer deposition method
J Koo, S Kim, S Jeon, H Jeon, Y Kim, Y Won
Journal of the Korean Physical Society 48 (1), 131-136, 2006
662006
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