Follow
임종태
임종태
한국전자통신연구원
Verified email at etri.re.kr
Title
Cited by
Cited by
Year
Neutral beam-assisted atomic layer chemical vapor deposition apparatus and method of processing substrate using the same
G Yeom, BJ Park, SW Kim, JT Lim
US Patent 7,799,706, 2010
3182010
Number of graphene layers as a modulator of the open-circuit voltage of graphene-based solar cell
K Ihm, JT Lim, KJ Lee, JW Kwon, TH Kang, S Chung, S Bae, JH Kim, ...
Applied Physics Letters 97 (3), 2010
952010
Efficient white organic light emission by single emitting layer
YW Ko, CH Chung, JH Lee, YH Kim, CY Sohn, BC Kim, CS Hwang, ...
Thin Solid Films 426 (1-2), 246-249, 2003
862003
A light scattering layer for internal light extraction of organic light-emitting diodes based on silver nanowires
K Lee, JW Shin, JH Park, J Lee, CW Joo, JI Lee, DH Cho, JT Lim, MC Oh, ...
ACS applied materials & interfaces 8 (27), 17409-17415, 2016
582016
Characteristics of SiO {sub x} N {sub y} films deposited by PECVD at low-temperature using BTBAS-NH {sub 3}-O {sub 2}
JH Lee, CH Jeong, JT Lim, VA Zavaleyev, KS Min, SJ Kyung, GY Yeom
Journal of the Korean Physical Society 48, 2006
562006
Efficient large-area transparent OLEDs based on a laminated top electrode with an embedded auxiliary mesh
S Park, JT Lim, WY Jin, H Lee, BH Kwon, NS Cho, JH Han, JW Kang, ...
ACS Photonics 4 (5), 1114-1122, 2017
542017
White-light-emitting devices based on organic multilayer structure
JT Lim, NH Lee, YJ Ahn, GW Kang, CH Lee
Current Applied Physics 2 (4), 295-298, 2002
452002
Flexion bonding transfer of multilayered graphene as a top electrode in transparent organic light-emitting diodes
J Tae Lim, H Lee, H Cho, BH Kwon, N Sung Cho, B Kuk Lee, J Park, ...
Scientific Reports 5 (1), 17748, 2015
422015
Efficient white light emitting devices with a blue emitting layer doped with a red dye
JT Lim, MJ Lee, NH Lee, YJ Ahn, CH Lee, DH Hwang
Current Applied Physics 4 (2-4), 327-330, 2004
412004
Polyimide surface treatment by atmospheric pressure plasma for metal adhesion
JB Park, JS Oh, EL Gil, SJ Kyoung, JT Lim, GY Yeom
Journal of The Electrochemical Society 157 (12), D614, 2010
402010
Top-emitting organic light-emitting diode using transparent conducting indium oxide layer fabricated by a two-step ion beam-assisted deposition
JT Lim, CH Jeong, A Vozny, JH Lee, MS Kim, GY Yeom
Surface and Coatings Technology 201 (9-11), 5358-5362, 2007
392007
Low angle forward reflected neutral beam source and its applications
BJ Park, SW Kim, SK Kang, KS Min, SD Park, SJ Kyung, HC Lee, JW Bae, ...
Journal of Physics D: Applied Physics 41 (2), 024005, 2008
342008
White top-emitting organic light-emitting diodes using one-emissive layer of the DCJTB doped DPVBi layer
MS Kim, CH Jeong, JT Lim, GY Yeom
Thin Solid Films 516 (11), 3590-3594, 2008
322008
Uniformity of internal linear-type inductively coupled plasma source for flat panel display processing
JH Lim, KN Kim, JK Park, JT Lim, GY Yeom
Applied Physics Letters 92 (5), 2008
282008
Anisotropic Etching of InP and InGaAs by Using an Inductively Coupled Plasma in Cl~ 2/N~ 2 and Cl~ 2/Ar Mixtures at Low Bias Power
JW Bae, CH Jeong, JT Lim, HC Lee, GY Yeom, I Adesida
JOURNAL-KOREAN PHYSICAL SOCIETY 50 (4), 1130, 2007
272007
White organic light-emitting diodes from three emitter layers
MS Kim, JT Lim, CH Jeong, JH Lee, GY Yeom
Thin Solid Films 515 (3), 891-895, 2006
262006
Effects of inductively coupled plasma treatment using O2, CF4, and CH4 on the characteristics of organic light emitting diodes
CH Jeong, JH Lee, JT Lim, MS Kim, GY Yeom
Surface and Coatings Technology 201 (9-11), 5012-5016, 2007
242007
Deposition of SiO2 by plasma enhanced chemical vapor deposition as the diffusion barrier to polymer substrates
CH Jeong, JH Lee, JT Lim, NG Cho, CH Moon, GY Yeom
Japanese journal of applied physics 44 (2R), 1022, 2005
242005
SiOxNy thin film deposited by plasma enhanced chemical vapor deposition at low temperature using HMDS–O2–NH3–Ar gas mixtures
JH Lee, CH Jeong, JT Lim, VA Zavaleyev, SJ Kyung, GY Yeom
Surface and Coatings Technology 201 (9-11), 4957-4960, 2007
232007
Characteristics of SiOxNy films deposited by inductively coupled plasma enhanced chemical vapor deposition using HMDS/NH3/O2/Ar for water vapor diffusion barrier
JH Lee, CH Jeong, HB Kim, JT Lim, SJ Kyung, GY Yeom
Thin Solid Films 515 (3), 917-921, 2006
232006
The system can't perform the operation now. Try again later.
Articles 1–20